Molecular models and activation energies for bonding rearrangement in plasma-deposited (formula presented) dielectric thin films treated by rapid thermal annealing
- Martínez, F.L.
- del Prado, A.
- Mártil, I.
- González-Diaz, G.
- Bohne, W.
- Fuhs, W.
- Röhrich, J.
- Selle, B.
- Sieber, I.
ISSN: 1550-235X, 1098-0121
Datum der Publikation: 2001
Ausgabe: 63
Nummer: 24
Art: Artikel