Microstructural modifications induced by rapid thermal annealing in plasma deposited SiOxNyHz films

  1. Del Prado, A.
  2. San Andrés, E.
  3. Mártil, I.
  4. González-Díaz, G.
  5. Bravo, D.
  6. López, F.J.
  7. Fernández, M.
  8. Martínez, F.L.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 2003

Volumen: 94

Número: 2

Pages: 1019-1029

Type: Article

DOI: 10.1063/1.1586979 GOOGLE SCHOLAR
La source de données: Scopus