Rapid thermally annealed plasma deposited SiNx:H thin films: Application to metal-insulator-semiconductor structures with Si, In 0.53Ga0.47 As, and InP
- Mártil, I.
- Del Prado, A.
- San Andrés, E.
- González Díaz, G.
- Martínez, F.L.
ISSN: 0021-8979
Year of publication: 2003
Volume: 94
Issue: 4
Pages: 2642-2653
Type: Article