Rapid thermally annealed plasma deposited SiNx:H thin films: Application to metal-insulator-semiconductor structures with Si, In 0.53Ga0.47 As, and InP
- Mártil, I.
- Del Prado, A.
- San Andrés, E.
- González Díaz, G.
- Martínez, F.L.
ISSN: 0021-8979
Argitalpen urtea: 2003
Alea: 94
Zenbakia: 4
Orrialdeak: 2642-2653
Mota: Artikulua