Molecular models and activation energies for bonding rearrangement in plasma-deposited α-SiNx: H dielectric thin films treated by rapid thermal annealing
- Martínez, F.L.
- Del Prado, A.
- Mártil, I.
- González-Diaz, G.
ISSN: 0163-1829
Year of publication: 2001
Volume: 63
Issue: 24
Pages: 2453201-2453211
Type: Article