Molecular models and activation energies for bonding rearrangement in plasma-deposited α-SiNx: H dielectric thin films treated by rapid thermal annealing
- Martínez, F.L.
- Del Prado, A.
- Mártil, I.
- González-Diaz, G.
ISSN: 0163-1829
Argitalpen urtea: 2001
Alea: 63
Zenbakia: 24
Orrialdeak: 2453201-2453211
Mota: Artikulua