Kinetics and Compositional Dependence on the Microwave Power and SiH4/N2 Flow Ratio of Silicon Nitride Deposited by Electron Cyclotron Resonance Plasmas
- Hernandez, M.J.
- Piqueras, J.
- Garrido, J.
- Martinez, J.
ISSN: 1945-7111, 0013-4651
Year of publication: 1994
Volume: 141
Issue: 11
Pages: 3234-3237
Type: Article