ETS de Ingeniería Industrial
Ikastegia
Zhengzhou University
Zhengzhou, ChinaZhengzhou University-ko ikertzaileekin lankidetzan egindako argitalpenak (1)
2019
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Computing topological indices of Sio2 layer structure and benzenoid series
Latin American Applied Research, Vol. 49, Núm. 4, pp. 219-224