Physical properties of high pressure reactively sputtered hafnium oxide

  1. Toledano-Luque, M.
  2. Martínez, F.L.
  3. San Andrés, E.
  4. del Prado, A.
  5. Mártil, I.
  6. González-Díaz, G.
  7. Bohne, W.
  8. Röhrich, J.
  9. Strub, E.
Revue:
Vacuum

ISSN: 0042-207X

Année de publication: 2008

Volumen: 82

Número: 12

Pages: 1391-1394

Type: Article

DOI: 10.1016/J.VACUUM.2008.03.083 GOOGLE SCHOLAR

Objectifs de Développement Durable