Optical absorption in amorphous hydrogenated silicon nitride thin films deposited by the electron cyclotron resonance plasma method and subjected to rapid thermal annealing

  1. Martínez, F.L.
  2. Mártil, I.
  3. González-Díaz, G.
  4. Bernal-Oliva, A.M.
  5. González-Leal, J.M.
  6. Márquez, E.
Revue:
Thin Solid Films

ISSN: 0040-6090

Année de publication: 1999

Volumen: 343-344

Número: 1-2

Pages: 433-436

Type: Article

DOI: 10.1016/S0040-6090(98)01669-1 GOOGLE SCHOLAR