Electrical properties of electron cyclotron resonance plasma-deposited silicon dioxide: Effect of the oxygen to silane flow ratio

  1. Hernandez, M.J.
  2. Garrido, J.
  3. Martinez, J.
  4. Piqueras, J.
Aldizkaria:
Semiconductor Science and Technology

ISSN: 0268-1242

Argitalpen urtea: 1996

Alea: 11

Zenbakia: 3

Orrialdeak: 422-426

Mota: Artikulua

DOI: 10.1088/0268-1242/11/3/023 GOOGLE SCHOLAR
Datuen iturria: Scopus