Electrical properties of electron cyclotron resonance plasma-deposited silicon dioxide: Effect of the oxygen to silane flow ratio

  1. Hernandez, M.J.
  2. Garrido, J.
  3. Martinez, J.
  4. Piqueras, J.
Revue:
Semiconductor Science and Technology

ISSN: 0268-1242

Année de publication: 1996

Volumen: 11

Número: 3

Pages: 422-426

Type: Article

DOI: 10.1088/0268-1242/11/3/023 GOOGLE SCHOLAR
La source de données: Scopus