Regrowth-process study of amorphous BF2+ ion-implanted silicon layers through spectroscopic ellipsometry

  1. Holgado, S.
  2. Martinez, J.
  3. Garrido, J.
  4. Piqueras, J.
Journal:
Applied Physics A Materials Science & Processing

ISSN: 0947-8396,  1432-0630

Year of publication: 1995

Volume: 60

Issue: 3

Pages: 325-332

Type: Article

DOI: 10.1007/BF01538413 GOOGLE SCHOLAR
Data source: Scopus