María Jesús Hernández Lucas-rekin lankidetzan egindako argitalpenak (4)

1999

  1. Kinetic and electrical characterization of thin silicon oxide films obtained by electron cyclotron resonance plasma

    Journal of Materials Science: Materials in Electronics, Vol. 10, Núm. 5, pp. 393-398

1997

  1. Compositional and electrical properties of ECR-CVD silicon oxynitrides

    Semiconductor Science and Technology, Vol. 12, Núm. 7, pp. 927-932

1996

  1. Electrical properties of electron cyclotron resonance plasma-deposited silicon dioxide: Effect of the oxygen to silane flow ratio

    Semiconductor Science and Technology, Vol. 11, Núm. 3, pp. 422-426

1994

  1. Kinetics and Compositional Dependence on the Microwave Power and SiH4/N2 Flow Ratio of Silicon Nitride Deposited by Electron Cyclotron Resonance Plasmas

    Journal of the Electrochemical Society, Vol. 141, Núm. 11, pp. 3234-3237