F.J. López-rekin lankidetzan egindako argitalpenak (8)

2003

  1. Microstructural modifications induced by rapid thermal annealing in plasma deposited SiOxNyHz films

    Journal of Applied Physics, Vol. 94, Núm. 2, pp. 1019-1029

  2. Optical and structural properties of SiOxNyHz films deposited by electron cyclotron resonance and their correlation with composition

    Journal of Applied Physics, Vol. 93, Núm. 11, pp. 8930-8938

2002

  1. Physical properties of plasma deposited SiOx thin films

    Vacuum

  2. Rapid thermal annealing effects on plasma deposited SiOx:H films

    Vacuum

2001

  1. Temperature effects on the electrical properties and structure of interfacial and bulk defects in Al/SiNx:H/Si devices

    Journal of Applied Physics, Vol. 90, Núm. 3, pp. 1573-1581

2000

  1. Defect structure of SiNx:H films and its evolution with annealing temperature

    Journal of Applied Physics, Vol. 88, Núm. 4, pp. 2149-2151

  2. Rapid thermal annealing effects on the structural properties and density of defects in SiO2 and SiNx: H films deposited by electron cyclotron resonance

    Journal of Applied Physics, Vol. 87, Núm. 3, pp. 1187-1192

1999

  1. Thermal stability of a-SiNx:H films deposited by plasma electron cyclotron resonance

    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 17, Núm. 4, pp. 1280-1284