Thermal stability of a-SiNx:H films deposited by plasma electron cyclotron resonance

  1. Martínez, F.L.
  2. Del Prado, A.
  3. Bravo, D.
  4. López, F.
  5. Mártil, I.
  6. González-Díaz, G.
Revue:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

ISSN: 0734-2101

Année de publication: 1999

Volumen: 17

Número: 4

Pages: 1280-1284

Type: Article

DOI: 10.1116/1.582110 GOOGLE SCHOLAR

Objectifs de Développement Durable

La source de données: Scopus