Rapid solid phase crystallization of nanocrystalline silicon deposited by electron cyclotron plasma chemical vapor deposition

  1. Holgado, S.
  2. Martínez, J.
  3. Garrido, J.
  4. Morant, C.
  5. Piqueras, J.
Revue:
Applied Physics Letters

ISSN: 0003-6951

Année de publication: 1996

Volumen: 69

Número: 13

Pages: 1873-1875

Type: Article

DOI: 10.1063/1.117462 GOOGLE SCHOLAR
La source de données: Scopus