Rapid thermal annealing behavior of amorphous SiC layers deposited by electron cyclotron resonance plasma

  1. Gomez, F.J.
  2. Garrido, J.
  3. Martinez, J.
  4. Piqueras, J.
Journal:
Journal of the Electrochemical Society

ISSN: 0013-4651

Year of publication: 1996

Volume: 143

Issue: 1

Pages: 271-277

Type: Article

DOI: 10.1149/1.1836421 GOOGLE SCHOLAR
Data source: Scopus