Physical properties of plasma deposited SiOx thin films

  1. San Andrés, E.
  2. Del Prado, A.
  3. Mártil, I.
  4. González, G.
  5. Martínez, F.L.
  6. Bravo, D.
  7. López, F.J.
  8. Fernández, M.
Journal:
Vacuum

ISSN: 0042-207X

Year of publication: 2002

Volume: 67

Issue: 3-4

Pages: 525-529

Type: Conference paper

DOI: 10.1016/S0042-207X(02)00243-9 GOOGLE SCHOLAR
Data source: Scopus