Kinetic and electrical characterization of thin silicon oxide films obtained by electron cyclotron resonance plasma

  1. Hernández, M.J.
  2. Cervera, M.
  3. Garrido, J.
  4. Martínez, J.
  5. Piqueras, J.
Revue:
Journal of Materials Science: Materials in Electronics

ISSN: 0957-4522

Année de publication: 1999

Volumen: 10

Número: 5

Pages: 393-398

Type: Article

DOI: 10.1023/A:1008985125423 GOOGLE SCHOLAR
La source de données: Scopus