Passivation, structural modification, and etching of amorphous silicon in hydrogen plasmas

  1. McQuaid, S.A.
  2. Holgado, S.
  3. Garrido, J.
  4. Martínez, J.
  5. Piqueras, J.
  6. Newman, R.C.
  7. Tucker, J.H.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 1997

Volumen: 81

Número: 11

Pages: 7612-7618

Type: Article

DOI: 10.1063/1.365337 GOOGLE SCHOLAR